Background effects on reconstructed WIMP couplings

In this talk, I presented effects of small, but non-negligible unrejected background events on the determinations of WIMP couplings/cross sections.Comment: 4 pages, 5 eps figures, to appear in the proceedings of the 12th International Conference on Topics in Astroparticle and Underground Physics (TAUP 2011), September 5-9, 2011, Munich, German

In situ transmission electron microscopy study on the epitaxial growth of CoSi2 on Si(111) at temperatures below 150 °C

We report an in situ transmission electron microscopy study on the epitaxial growth of CoSi2 on Si(111) from a 10-nm-thick amorphous mixture of Co and Si in the ratio 1:2 which was formed by codeposition of Co and Si near room temperature. Nuclei of CoSi2 are observed in the as-deposited film. These nuclei are epitaxial and extend through the whole film thickness. Upon annealing, these columnar epitaxial CoSi2 grains grow laterally at temperatures as low as 50 °C. The kinetics of this lateral epitaxial growth was studied at temperatures between 50 and 150 °C. The activation energy of the growth process is 0.8±0.1 eV

Reactions of metastable nitrogen atoms

Line absorption analysis and reaction kinetics of two metastable nitrogen atomic energy level

Mass Spectrum and Bounds on the Couplings in Yukawa Models With Mirror-Fermions

The $\rm SU(2)_L\otimes SU(2)_R$ symmetric Yukawa model with mirror-fermions in the limit where the mirror-fermion is decoupled is studied both analytically and numerically. The bare scalar self-coupling $\lambda$ is fixed at zero and infinity. The phase structure is explored and the relevant phase transition is found to be consistent with a second order one. The fermionic mass spectrum close to that transition is discussed and a first non-perturbative estimate of the influence of fermions on the upper and lower bounds on the renormalized scalar self-coupling is given. Numerical results are confronted with perturbative predictions.Comment: 7 (Latex) page

Experimental investigation of a double-diffused MOS structure

Self-aligned polysilicon gate technology was applied to double-diffused MOS (DMOS) construction in a manner that retains processing simplicity and effectively eliminates parasitic overlap capacitance because of the self-aligning feature. Depletion mode load devices with the same dimensions as the DMOS transistors were integrated. The ratioless feature results in smaller dimension load devices, allowing for higher density integration with no increase in the processing complexity of standard MOS technology. A number of inverters connected as ring oscillators were used as a vehicle to test the performance and to verify the anticipated benefits. The propagation time-power dissipation product and process related parameters were measured and evaluated. This report includes (1) details of the process; (2) test data and design details for the DMOS transistor, the load device, the inverter, the ring oscillator, and a shift register with a novel tapered geometry for the output stages; and (3) an analytical treatment of the effect of the distributed silicon gate resistance and capacitance on the speed of DMOS transistors